In-situ IR spectroscopy to study anodic oxidation of Si(111) in KOH solution

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In-situ IR spectroscopy to study anodic oxidation of Si(111) in KOH solution
 
Philipsen, H.G.G.; Chazalviel, J.-N.; Allongue, P.; Ozanam, F.; Kelly, J.J.
(2007) ECS Transactions, volume 6, issue 2, pp. 481 - 488
(Article)
Abstract
Fourier Transform Infrared (FTIR) spectroscopy was used to study in-situ the anodic oxidation of n-type Si(111) in KOH solution. Changes in surface chemistry were followed during oxide growth. The results are considered on the basis of a model developed from electrochemical measurements.
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Open Access version via Utrecht University Repository Author version
 
ISSN: 1938-5862
Publisher: Electrochemical Society, Inc.
(Peer reviewed)
 
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