Surface termination and hydrogen bubble adhesion on Si(100) surfaces during anisotropic dissolution in aqueous KOH

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Surface termination and hydrogen bubble adhesion on Si(100) surfaces during anisotropic dissolution in aqueous KOH
 
Haiss, W.; Raisch, P.; Bitsch, L.; Nichols, R.J.; Xia, X.; Kelly, J.J.; Schiffrin, D.J.
(2006) Journal of Electroanalytical Chemistry, volume 597, pp. 1 - 12
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ISSN: 0022-0728
(Peer reviewed)
 
 
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