Exploiting anisotropy for in situ measurement of silicon etch rates in KOH solution
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Exploiting anisotropy for in situ measurement of silicon etch rates in KOH solution
Philipsen, H.G.G.; Smeenk, N.J.; Ligthart, H.; Kelly, J.J.
(2006) Electrochemical and Solid-State Letters, volume 9, pp. C118 - C121
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ISSN: 1099-0062
Publisher: Electrochemical Society, Inc.
(Peer reviewed)
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