Etching AlAs with HF for epitaxial lift-off applications

Voncken, M.M.A.J.; Schermer, J.J.; van Niftrik, A.T.J.; Bauhuis, G.J.; Mulder, P.; Larsen, P.K.; Peters, T.P.J.; de Bruin, B.; Klaassen, A.; Kelly, J.J.

doi:https://doi.org/10.1149/1.1690293

Etching AlAs with HF for epitaxial lift-off applications

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Etching AlAs with HF for epitaxial lift-off applications

Voncken, M.M.A.J.; Schermer, J.J.; van Niftrik, A.T.J.; Bauhuis, G.J.; Mulder, P.; Larsen, P.K.; Peters, T.P.J.; de Bruin, B.; Klaassen, A.; Kelly, J.J.

(2004) Journal of the Electrochemical Society, volume 151, issue 5, pp. G347 - G352

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DOI: https://doi.org/10.1149/1.1690293

ISSN: 0013-4651

Publisher: Electrochemical Society, Inc.

(Peer reviewed)

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